The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Apr. 16, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Clayton R. DeCamillis, Raleigh, NC (US);

Joseph M. Wander, Chapel Hill, NC (US);

Richard C. Hazelhurst, Holly Springs, NC (US);

Michael L. Hampton, Raleigh, NC (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05B 6/68 (2006.01); H05B 6/70 (2006.01); H05B 6/80 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H05B 6/686 (2013.01); H01L 21/67115 (2013.01); H05B 6/705 (2013.01); H05B 6/80 (2013.01);
Abstract

A materials processing system comprises a thermal processing chamber and a broadband microwave power source. The power source includes an ovenized small-signal RF circuit, a high power microwave amplifier, and forward and reflected power detectors separated from one another by an isolator. The power detectors are also preferably ovenized. A control system provides control signals to the thermally stabilized VCO and VCA in the small-signal circuit to control output power based on detected forward power compared to demanded forward power. The system may be run in either open-loop or closed-loop modes.


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