The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

May. 23, 2014
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventor:

Wolfgang Friza, Villach, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); H04R 7/14 (2006.01); H04R 19/00 (2006.01); H04R 31/00 (2006.01); H04R 19/02 (2006.01); B81C 1/00 (2006.01); H04R 19/04 (2006.01);
U.S. Cl.
CPC ...
H04R 7/14 (2013.01); B81C 1/00603 (2013.01); H04R 19/005 (2013.01); H04R 19/02 (2013.01); H04R 31/00 (2013.01); H04R 31/003 (2013.01); B81B 2201/0257 (2013.01); B81B 2203/0353 (2013.01); H04R 19/04 (2013.01); H04R 2201/003 (2013.01);
Abstract

A method for manufacturing an opening structure is provided. The method may include: forming a patterned mask over a first side of a carrier; forming material over the first side of the carrier covering at least a portion of the carrier; forming a first opening in the carrier from a second side of the carrier opposite the first side of the carrier to at least partially expose a surface of the patterned mask; and forming a second opening in the material from the second side of the carrier using the patterned mask as a mask.


Find Patent Forward Citations

Friza, Wolfgang. (2019). Method for manufacturing an opening structure and opening structure (U.S. Patent No. 10469948). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10469948

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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