The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Jul. 11, 2016
Applicant:

Fuji Electric Co., Ltd., Kawasaki-shi, Kanagawa, JP;

Inventor:

Mutsumi Kitamura, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 21/225 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7397 (2013.01); H01L 29/0623 (2013.01); H01L 29/0634 (2013.01); H01L 29/66348 (2013.01); H01L 21/2253 (2013.01); H01L 29/0619 (2013.01);
Abstract

A semiconductor device includes: a drift layer of a first conductivity type, implementing a main semiconductor layer; a base region of a second conductivity type provided on an top surface side of the drift layer; a first main electrode region of the first conductivity type provided in an upper part of the base region, having an impurity concentration higher than the main semiconductor layer; a gate electrode buried in a trench penetrating the first main electrode region and the base region through a gate insulating film; a gate screening semiconductor layer of the second conductivity type, being buried under a bottom of the trench; an intermediate semiconductor layer of the first conductivity type sandwiched between the base region and the gate screening semiconductor layer; and a second main electrode region of the second conductivity type provided on a bottom surface side of the drift layer.


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