The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

May. 14, 2014
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Armin Willmeroth, Augsburg, DE;

Franz Hirler, Isen, DE;

Bjoern Fischer, Munich, DE;

Joachim Weyers, Hoehenkirchen-Siegertsbrunn, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H02M 1/08 (2006.01); H01L 29/40 (2006.01); H02M 1/00 (2006.01); H01L 29/423 (2006.01); H01L 29/10 (2006.01); H02M 3/155 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 29/402 (2013.01); H01L 29/7802 (2013.01); H01L 29/7809 (2013.01); H01L 29/7811 (2013.01); H01L 29/7813 (2013.01); H02M 1/08 (2013.01); H01L 29/063 (2013.01); H01L 29/0615 (2013.01); H01L 29/0623 (2013.01); H01L 29/0649 (2013.01); H01L 29/1095 (2013.01); H01L 29/4238 (2013.01); H02M 3/155 (2013.01); H02M 2001/0054 (2013.01);
Abstract

A semiconductor device includes a semiconductor body, which includes transistor cells and a drift zone between a drain layer and the transistor cells. The drift zone includes a compensation structure. Above a depletion voltage a first output charge gradient obtained by increasing a drain-to-source voltage from the depletion voltage to a maximum drain-to-source voltage deviates by less than 5% from a second output charge gradient obtained by decreasing the drain-to-source voltage from the maximum drain-to-source voltage to the depletion voltage. At the depletion voltage the first output charge gradient exhibits a maximum curvature.


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