logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10468264 B1

PDFFull Text
Date of Patent:
Nov. 05, 2019

Filed:

Jun. 05, 2017

Method of fabricating semiconductor device

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Jae Soon Lim, Seoul, KR;

Gyu Hee Park, Hwaseong-si, KR;

Youn Joung Cho, Hwaseong-si, KR;

Hyun Suk Lee, Hwaseong-si, KR;

Gi Hee Cho, Yongin-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:

Volentine, Whitt & Francos, PLLC

Primary Examiner:

Matthew J Song

Int. Cl.
CPC ...
H01L 21/30 (2006.01); C30B 25/14 (2006.01); C30B 29/06 (2006.01); H01L 21/768 (2006.01); H01L 23/29 (2006.01); H01L 23/528 (2006.01);
U.S. Cl.
CPC ...
H01L 21/30 (2013.01); C30B 25/14 (2013.01); C30B 29/06 (2013.01); H01L 21/76829 (2013.01); H01L 21/76834 (2013.01); H01L 23/291 (2013.01); H01L 23/528 (2013.01); H01L 23/5283 (2013.01);
Abstract

A method of fabricating a semiconductor device includes feeding a suppression gas, a source gas, a reactive gas, and a purge gas including an inert gas, into a process chamber in which a substrate is disposed. The suppression gas suppresses the physical adsorption of the source gas onto the substrate. As a result, a thin film is formed on the substrate.

Find Patent Forward Citations

Lim, Jae. (2019). Method of fabricating semiconductor device (U.S. Patent No. 10468264). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10468264

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…