The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Oct. 28, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Ju-young Kim, Hwaseong-si, KR;
Jeong-ju Park, Hwaseong-si, KR;
Jin Park, Yongin-si, KR;
Hai-sub Na, Seoul, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); H01L 21/033 (2006.01); C11D 1/00 (2006.01); C11D 11/00 (2006.01); H01L 21/027 (2006.01); G03F 7/42 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); C11D 1/00 (2013.01); C11D 11/0047 (2013.01); G03F 7/42 (2013.01); H01L 21/0274 (2013.01); H01L 21/0332 (2013.01);
Abstract
A rinse solution includes a surfactant and deionized water. The surfactant includes a compound having a branched structure, the compound having a branched structure including a hydrophobic group-containing main chain and a plurality of side chains that are branched from the main chain and have at least one hydrophilic functional group. A method of fabricating an integrated circuit device includes forming a photoresist pattern, followed by applying the rinse solution onto the photoresist pattern.