The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Aug. 23, 2018
Canon Kabushiki Kaisha, Tokyo, JP;
Taichi Yoshioka, Utsunomiya, JP;
Yusuke Kurita, Utsunomiya, JP;
Tohru Suzuki, Utsunomiya, JP;
Moritaka Iwakoshi, Kawasaki, JP;
Taizou Kawada, Utsunomiya, JP;
Hironori Okazumi, Tokyo, JP;
Shunsuke Karaki, Minamitsuru-gun, JP;
Takayuki Hashimoto, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A lithography apparatus detects a plurality of first substrate-side marks arranged with respect to a part of shot regions on which patterning is to be performed by using the first original in the lithography apparatus and detects a plurality of second substrate-side marks arranged with respect to other shot regions different from the part of the shot regions on which patterning is to be performed by using the second original different from the first original in another lithography apparatus. The lithography apparatus outputs information on detection results of the plurality of second substrate-side marks to be available in the other lithography apparatus. Then, based on detection results of the plurality of first substrate-side marks, the lithography apparatus performs patterning while performing alignment with the first original with respect to the part of the shot regions.