The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2019

Filed:

Sep. 15, 2015
Applicant:

Dic Corporation, Tokyo, JP;

Inventor:

Tomoyuki Imada, Ichihara, JP;

Assignee:

DIC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); C07C 37/16 (2006.01); C07C 39/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 37/16 (2013.01); C07C 39/14 (2013.01); G03F 7/0045 (2013.01);
Abstract

Provided are a naphtol-type calixarene compound having high solvent solubility, a method for producing the naphthol-type calixarene compound, a photosensitive composition that contains the naphthol-type calixarene compound and provides a coating having high thermal decomposition resistance, alkali developability, photosensitivity, and resolution, and a resist material and a coating each being made of the photosensitive composition. Specifically, provided is a naphthol-type calixarene compound including a molecular structure represented by general formula (1). [In the formula (1), Rrepresents a hydrogen atom, an alkyl group, an alkoxy group, an optionally substituted aryl group, an optionally substituted aralkyl group, or a halogen atom, and a plurality of Rmay be the same or different from each other; Rrepresents an optionally substituted alkyl group or an optionally substituted aryl group; and n represents an integer of 2 to 10].


Find Patent Forward Citations

Loading…