The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Jan. 11, 2017
Boe Technology Group Co., Ltd., Beijing, CN;
Beijing Boe Optoelectronics Technology Co., Ltd., Beijing, CN;
Zhenhua Lv, Beijing, CN;
Xi Chen, Beijing, CN;
Shijun Wang, Beijing, CN;
Zhiying Bao, Beijing, CN;
Yong Zhang, Beijing, CN;
Yue Li, Beijing, CN;
Wenjun Xiao, Beijing, CN;
Yanna Xue, Beijing, CN;
Wenbo Jiang, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a photoetching mask plate, a method for manufacturing the photoetching mask plate, and a photoetching method using the photoetching mask plate. The photoetching mask plate includes a base substrate, a mask pattern arranged on a surface of the base substrate, and a conductive connection pattern arranged on the surface of the base substrate. The conductive connection pattern is configured to electrically connect separate portions of the mask pattern to each other.