The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Jun. 30, 2015
Samsung Electronics Co., Ltd., Suwon-si, KR;
Shigeto Kobori, Yokohama, JP;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
Provided is a silica film, etc. not having the film strength thereof being easily degraded, even when hollow silica particles are contained therein. Further, provided is a silica film, etc. having a lower reflectivity. A silica layer (the silica film) comprises silica and fluorinated hollow silica particles. The silica is formed by converting polysilazane into silica. The fluorinated hollow silica particles are locally distributed on the surface of the silica layer. The part where the fluorinated hollow silica particles are localized has the function of a low refractive index layer, and the parts other than the part where the fluorinated hollow silica particles are localized have the function of a hard coat layer.