The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Dec. 09, 2015
Hitachi, Ltd., Chiyoda-ku, Tokyo, JP;
Masako Ishimaru, Tokyo, JP;
Masao Kamahori, Tokyo, JP;
Masuyuki Sugiyama, Tokyo, JP;
Kazushige Nishimura, Tokyo, JP;
Hiroyuki Satake, Tokyo, JP;
Hideki Hasegawa, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
In order to implement a high-sensitivity mass spectrometry through an improvement in solvent removal efficiency during electrospray ionization and the like, an ionization device is provided with a light guide pathwhich guides light from a light source to sample microparticles generated by a micronization device to irradiate the microparticles. A closest distance d2 between a spatial areain which the sample microparticles are present and a distal endof the light guide path is greater than or equal to 0.1 mm and less than or equal to 20 mm. A closest distance d1 between an area of light irradiationby the light guide path and any of a sample surface, a micronization device, and a sample holding unit that is the closest is greater than or equal to 0.01 mm and less than or equal to 10 mm.