The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2019
Filed:
Feb. 02, 2016
The Trustees of Dartmouth College, Hanover, NH (US);
Stephen Chad Kanick, Lebanon, NH (US);
Brian William Pogue, Hanover, NH (US);
Keith D. Paulsen, Hanover, NH (US);
Jonathan T. Elliott, West Lebanon, NH (US);
David M. McClatchy, III, Hanover, NH (US);
Venkataramanan Krishnaswamy, Lebanon, NH (US);
THE TRUSTEES OF DARTMOUTH COLLEGE, Hanover, NH (US);
Abstract
A method for determining sub-diffuse scattering parameters of a material includes illuminating the material with structured light and imaging remission by the material of the structured light. The method further includes determining, from captured remission images, sub-diffuse scattering parameters of the material. A structured-light imaging system for determining sub-diffuse scattering parameters of a material includes a structured-light illuminator, for illuminating the material with structured light of periodic spatial structure, and a camera for capturing images of the remission of the structured light by the material. The structured-light imaging system further includes an analysis module for processing the images to quantitatively determine the sub-diffuse scattering parameters. A software product includes machine-readable instructions for analyzing images of remission of structured light by a material to determine sub-diffuse scattering parameters of the material.