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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10460852 B1

PDFFull Text
Date of Patent:
Oct. 29, 2019

Filed:

Jan. 09, 2015

Electrode having nano mesh multi-layer structure, using single crystal copper, and manufacturing method therefor

Applicant:

Pusan National University Industrial-university Cooperation Foundation, Busan, KR;

Inventors:

Se-young Jeong, Busan, KR;

Ji-young Kim, Yangsan-si, KR;

Won-kyung Kim, Busan, KR;

Assignee:

PUSAN NATIONAL UNIVERSITY INDUSTRIAL-UNIVERSITY COOPERATION FOUNDATION, , KR;

Attorney:

Park & Associates IP Law, P.C.

Primary Examiner:

Ian A Rummel

Int. Cl.
CPC ...
H01B 1/08 (2006.01); H01B 5/14 (2006.01); H01B 13/00 (2006.01); C23C 14/34 (2006.01); C30B 29/02 (2006.01); C30B 33/10 (2006.01); C23C 14/08 (2006.01); C23C 14/20 (2006.01); H01B 1/02 (2006.01); C30B 23/08 (2006.01); H01L 31/0224 (2006.01); H01L 51/00 (2006.01); H01L 51/44 (2006.01); H01L 51/52 (2006.01); H01L 51/10 (2006.01);
U.S. Cl.
CPC ...
H01B 5/14 (2013.01); C23C 14/086 (2013.01); C23C 14/205 (2013.01); C23C 14/34 (2013.01); C30B 23/08 (2013.01); C30B 29/02 (2013.01); C30B 33/10 (2013.01); H01B 1/02 (2013.01); H01B 1/08 (2013.01); H01B 13/0036 (2013.01); H01L 31/022466 (2013.01); H01L 51/0023 (2013.01); H01L 51/445 (2013.01); H01L 51/5212 (2013.01); H01L 51/102 (2013.01); Y02E 10/549 (2013.01);
Abstract

The present invention relates to an electrode having a multilayer nanomesh structure using single-crystalline copper and a method for manufacturing same, the electrode comprising: a substrate; a single-crystalline copper electrode layer formed on the substrate and having a hive-shaped pattern with a nano-sized line width; and a metal oxide layer formed on the single-crystalline copper electrode layer, this providing an electrode having excellent optical transmittance, low electrical sheet resistance, and excellent mechanical stability. The present invention is technically characterized by an electrode having a multilayer nanomesh structure using single-crystalline copper, the electrode comprising: a substrate; a single-crystalline copper electrode layer formed on the substrate and having a hive-shaped pattern with a nano-sized line width; and a metal oxide layer formed on the single-crystalline copper electrode layer.

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Jeong, Se-young. (2019). Electrode having nano mesh multi-layer structure, using single crystal copper, and manufacturing method therefor (U.S. Patent No. 10460852). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10460852

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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