The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
Jun. 08, 2018
Canon Kabushiki Kaisha, Tokyo, JP;
Yoshio Goto, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
According to an aspect of the invention, an exposure method includes: moving a substrate during a period from a start to an end of exposure performed on any region among a plurality of exposure regions, wherein a timing at which the substrate is moved during the period is determined on the basis of a difference between a width of the pattern formed on the substrate in a first direction on a surface of the substrate and a width of the pattern formed on the substrate in a second direction on the surface of the substrate different from the first direction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile