The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2019

Filed:

Oct. 27, 2016
Applicant:

Georgia Tech Research Corporation, Atlanta, GA (US);

Inventors:

Won Tae Choi, Atlanta, GA (US);

Laurens Victor Breedveld, Atlanta, GA (US);

Dennis W. Hess, Atlanta, GA (US);

Kkochnim Oh, Atlanta, GA (US);

Preet M. Singh, Atlanta, GA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/06 (2006.01);
U.S. Cl.
CPC ...
C25F 3/06 (2013.01);
Abstract

An exemplary embodiment of the present invention provides a method for anti-wetting metallic surfaces. A metallic object is introduced to an electrochemical solution. A cathode is introduced to the electrochemical solution, and an anode is attached to the metallic object. An electric potential between the cathode and anode is applied, such that selective electrochemical etching of the surface of the metallic object occurs. The selective etching etches grain boundaries at the surface of the metallic object, and the grain boundaries define grain faces.


Find Patent Forward Citations

Choi, Won. (2019). Systems and methods for producing anti-wetting structures on metallic surfaces (U.S. Patent No. 10458037). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10458037

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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