The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
Feb. 20, 2017
Linde Aktiengesellschaft, Munich, DE;
Torben Hofel, Munich, DE;
Martin Kamann, Oberhaching, DE;
Michael Scholch, Starnberg, DE;
Sean McCracken, Puchheim, DE;
Josef Kunkel, Gauting, DE;
Gunther Kracker-Semler, Unterhaching, DE;
LINDE AKTIENGESELLSCHAFT, Munich, DE;
Abstract
A method for obtaining an ethylene product in a supercritical state is proposed, in which method a gas mixture containing predominantly or exclusively ethylene and ethane is separated in a distillation column (), which is operated at a distillation pressure level of from 5 to 15 bar, into an overhead product containing predominantly or exclusively ethylene and a bottom product containing predominantly or exclusively ethane, the overhead product being withdrawn in the gaseous state from the head of the distillation column () and a first portion thereof being liquefied and returned as reflux to the distillation column () and a second portion thereof being converted into a supercritical state and being used as the ethylene product. Provision is made that, for converting the second portion into the supercritical state, multi-stage compression from the distillation pressure level via a plurality of intermediate pressure levels to a supercritical pressure level is carried out, the second portion in the multi-stage compression being converted predominantly or exclusively from the gaseous into the supercritical state. A corresponding installation is likewise a subject of the invention.