The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2019
Filed:
Dec. 15, 2017
Massachusetts Institute of Technology, Cambridge, MA (US);
Wojciech Matusik, Lexington, MA (US);
Allen S. Park, Cambridge, MA (US);
Javier E. Ramos, San Juan, PR (US);
Kiril Vidimce, Cambridge, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A closed-loop adaptive material deposition apparatus and method uses a scanning system to monitor an additively manufactured object as it is being fabricated and adapting the geometric shape and material composition of the subsequent layers based on the scan data. The scanning system repeatedly captures geometric and/or material information of a partially manufactured object with optional auxiliary objects inserted during the manufacturing process. Based on this information, the actual surface geometry and/or actual material composition is computed. Surface geometry may be offset and used as a slicing surface for the next portion of the digital model. The shape of the slicing surface may then be recomputed each time the system scans the partially fabricated object.