The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Oct. 26, 2015
Applicant:

Oath Inc., New York, NY (US);

Inventor:

Zicheng Huang, Beijing, CN;

Assignee:

Oath Inc., New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 15/173 (2006.01); H04L 29/06 (2006.01); G06F 11/30 (2006.01);
U.S. Cl.
CPC ...
H04L 63/00 (2013.01); G06F 11/30 (2013.01);
Abstract

In one embodiment, a workflow data structure may be generated, updated, or obtained. The workflow data structure may represent system processes, relationships among the system processes, data input to the system processes, data generated by the system processes, and estimated running times associated with the system processes, wherein the data generated by the system processes includes a plurality of metrics. A scheduling map may be generated or updated based, at least in part, on the relationships among the system processes and the estimated running times associated with the system processes, where the scheduling map indicates estimated times at which the metrics are anticipated to be available. The metrics may be monitored based, at least in part, on the scheduling map. Anomalies may be detected according to a result of monitoring the metrics.


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