The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Apr. 17, 2019
Applicant:

Lg Innotek Co., Ltd., Seoul, KR;

Inventors:

Jong Lam Lee, Kyungbuk, KR;

In-kwon Jeong, Cupertino, CA (US);

Myung Cheol Yoo, Pleasanton, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/12 (2010.01); H01C 7/00 (2006.01); H01L 33/36 (2010.01); H01L 33/62 (2010.01); H01L 33/40 (2010.01); H01L 33/06 (2010.01); H01L 33/00 (2010.01); H01L 33/38 (2010.01); H01L 33/44 (2010.01); H01L 33/32 (2010.01); H01L 49/02 (2006.01); H01L 27/08 (2006.01);
U.S. Cl.
CPC ...
H01L 33/12 (2013.01); H01C 7/006 (2013.01); H01C 7/008 (2013.01); H01L 27/0802 (2013.01); H01L 28/20 (2013.01); H01L 33/007 (2013.01); H01L 33/0025 (2013.01); H01L 33/0079 (2013.01); H01L 33/0095 (2013.01); H01L 33/06 (2013.01); H01L 33/32 (2013.01); H01L 33/36 (2013.01); H01L 33/38 (2013.01); H01L 33/40 (2013.01); H01L 33/44 (2013.01); H01L 33/62 (2013.01); Y10S 438/958 (2013.01); Y10S 438/977 (2013.01);
Abstract

A method of manufacturing a light emitting device can include forming an n-type GaN-based layer on a sapphire substrate; forming a GaN-based active layer on the n-type GaN-based layer; forming a p-type GaN-based layer on the GaN-based active layer; forming a p-type electrode on the p-type GaN-based layer; forming a metal substrate on the p-type electrode; removing the sapphire substrate; forming an n-type electrode on the n-type GaN-based layer; forming a passivation layer on a side surface of the p-type GaN-based layer, a side surface of the GaN-based active layer, a side surface of the n-type GaN-based layer, an upper surface of the n-type GaN-based layer, a side surface of the n-type electrode, and an upper surface of the n-type electrode after the forming the n-type electrode; and forming an open space to expose the n-type electrode by patterning the passivation layer.


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