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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10453729 B1

PDFFull Text
Date of Patent:
Oct. 22, 2019

Filed:

Mar. 08, 2018

Substrate treatment apparatus and substrate treatment method

Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Tatsuhiko Koide, Kuwana, JP;

Hiroyasu Iimori, Mie, JP;

Shinsuke Kimura, Yokkaichi, JP;

Assignee:

TOSHIBA MEMORY CORPORATION, Minato-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Zandra V Smith

Assistant Examiner:

Andre C Stevenson

Int. Cl.
CPC ...
H01L 21/68 (2006.01); H01L 21/673 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68 (2013.01); H01L 21/02348 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/6776 (2013.01); H01L 21/67115 (2013.01); H01L 21/67379 (2013.01); H01L 21/67383 (2013.01); H01L 21/67706 (2013.01);
Abstract

According to an embodiment, a substrate treatment apparatus includes a support unit, a silane coupler supplier, an organic functional group remover, and a drive mechanism. The support supports a substrate having a patterned film. The silane coupler supplier supplies the film with a silane coupler. The organic functional group remover removes an organic functional group from the film silylated with the silane coupler. The drive mechanism drives at least one of the support, the silane coupler supplier, and the organic functional group remover in such a way that the supply of the silane coupler and the supply of light or gas are repeated by a predetermined number.

Find Patent Forward Citations

Koide, Tatsuhiko. (2019). Substrate treatment apparatus and substrate treatment method (U.S. Patent No. 10453729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10453729

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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