The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Jan. 08, 2016
Eui-sun Choi, Seoul, KR;
Nam-ii Koo, Hwaseong-si, KR;
Ji-min Lee, Seoul, KR;
Hyung-kyu Lee, Seoul, KR;
Min-seok Choi, Hwaseong-si, KR;
Eui-Sun Choi, Seoul, KR;
Nam-Ii Koo, Hwaseong-si, KR;
Ji-Min Lee, Seoul, KR;
Hyung-Kyu Lee, Seoul, KR;
Min-Seok Choi, Hwaseong-si, KR;
Samsung Electronics, Co., Ltd., Gyeonggi-do, KR;
Abstract
Example embodiments relate to a manufacturing device of an anti-reflecting structure and a method for manufacturing the anti-reflecting structure. The manufacturing device of an anti-reflecting structure includes a carrier film on which a stamp structure is formed, an unwinding unit which unwinds the carrier film, a substrate support unit which provides a target substrate to the carrier film, a pressing unit which applies pressure to the carrier film so that a resin provided in the stamp structure is provided to the target substrate, and a winding unit which winds the carrier film from which an anti-reflecting pattern is transferred to the target substrate, wherein the pressing unit includes a chamber which stores the target substrate, and a vent hole formed in the chamber, and air within the chamber is discharged through the vent hole to lower the air pressure in the chamber and apply pressure to the carrier film.