The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Oct. 27, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Charles L. Arvin, Savannah, GA (US);

Glen N. Biggs, Wappingers Falls, NY (US);

Phillip W. Palmatier, Hopewell Junction, NY (US);

Joseph C. Sorbello, Wappingers Falls, NY (US);

Tracy A. Tong, Wallkill, NY (US);

Freddie Torres, Beacon, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 21/18 (2006.01); C25D 21/06 (2006.01); C25D 21/14 (2006.01); C25D 3/30 (2006.01); C25D 3/38 (2006.01);
U.S. Cl.
CPC ...
C25D 21/18 (2013.01); C25D 21/06 (2013.01); C25D 21/14 (2013.01); C25D 3/30 (2013.01); C25D 3/38 (2013.01);
Abstract

Electroplating techniques including a system for treating a solution for use in an electroplating application and a method for using the system are provided. The system can have: a gas dispersing portion configured to treat the solution by dispersing a gas into the solution to control a concentration of a predetermined cation of a metal to be electroplated in the electroplating application; a filter portion configured to treat the solution by filtering the solution to remove a quantity of metal residue; and a circulation mechanism configured to divert the solution to one of a plating tool and a combination of the gas dispersing portion and the filter portion based on a result of an analysis of the solution.


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