The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Oct. 18, 2017
Applicant:

Virox Technologies Inc., Oakville, Ontario, CA;

Inventor:

Faraz Ahmadpour, Mississauga, CA;

Assignee:

VIROX TECHNOLOGIES INC., Oakville, Ontario, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/43 (2006.01); C11D 3/39 (2006.01); C11D 1/22 (2006.01); C11D 1/83 (2006.01); C11D 3/20 (2006.01); A01N 41/04 (2006.01); C11D 3/34 (2006.01); A01N 59/00 (2006.01); A01N 37/10 (2006.01); A01N 37/40 (2006.01); C11D 3/48 (2006.01); C11D 1/12 (2006.01); C11D 1/14 (2006.01); C11D 3/33 (2006.01); C11D 3/36 (2006.01); C11D 1/72 (2006.01);
U.S. Cl.
CPC ...
C11D 3/3942 (2013.01); A01N 37/10 (2013.01); A01N 37/40 (2013.01); A01N 41/04 (2013.01); A01N 59/00 (2013.01); C11D 1/123 (2013.01); C11D 1/143 (2013.01); C11D 1/146 (2013.01); C11D 1/22 (2013.01); C11D 1/83 (2013.01); C11D 3/2086 (2013.01); C11D 3/33 (2013.01); C11D 3/34 (2013.01); C11D 3/3409 (2013.01); C11D 3/3418 (2013.01); C11D 3/3472 (2013.01); C11D 3/361 (2013.01); C11D 3/3947 (2013.01); C11D 3/43 (2013.01); C11D 3/48 (2013.01); C11D 1/72 (2013.01);
Abstract

A disinfecting solution includes hydrogen peroxide at a concentration of from about 1.5% w/w to 8% w/w; at least one readily biodegradable anionic surfactant in a concentration of from about 10% w/w to about 25% w/w; at least one of salicylic acid and salts thereof, in a concentration of from about 1% w/w to about 8% w/w; at least one chelating agent in a concentration of from about 0.005% w/w to about 10% w/w; and at least one low-corrosive non-surfactant sulfonic acid selected from benzenesulfonic acid, benzene disulfonic acid, xylene sulfonic acid, toluene sulfonic acid, cumene sulfonic acid, sulfosalicylic acid, naphthalene mono- or di-sulfonic acid, methane sulfonic acid, and isethionic acid in a concentration of from about 1% w/w to about 15% w/w. The solution is free of acetic acid, furoic acid, phenylacetic acid, cationic surfactants, amphoteric surfactants, aromatic alcohols, halogen acids, phenols, peracid activators, bleaches, and (optionally) benzoic acid.


Find Patent Forward Citations

Loading…