The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Jun. 11, 2014
Riken Technos Corporation, Tokyo, JP;
Kohei Nakashima, Tokyo, JP;
Kazutaka Yamada, Tokyo, JP;
Hidemasa Sugimoto, Tokyo, JP;
Yoshihiro Zennyoji, Tokyo, JP;
RIKEN TECHNOS CORPORATION, , JP;
Abstract
Embodiments of the invention relate to a poly(meth)acrylimide film and a method for manufacturing such a film. At least one embodiment provides a poly(meth)acrylimide film that has (i) a total light transmittance of over 90% and (ii) haze of 2.0% or less. This film preferably has retardation of less than 50 nm. The method for manufacturing this film includes the following steps: (A) using a device provided with an extruder and a T die, a poly(meth)acrylimide molten film is continuously extruded from the T die; and (B) the poly(meth)acrylimide molten film is loaded by being fed between a rotating or circulating first mirrored-surface body and a rotating or circulating second mirrored-surface body, and then the film is pressed. During these steps, (C) the surface temperature of the first mirrored-surface body is in the range 100-200° C., and (D) the surface temperature of the second mirrored-surface body is in the range 20-200° C.