The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Feb. 28, 2013
Applicant:
General Electric Company, Schenectady, NY (US);
Inventors:
Paul Edward Gray, North East, MD (US);
Herbert Chidsey Roberts, III, Simpsonville, SC (US);
Glenn Curtis Taxacher, Simpsonville, SC (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/573 (2006.01); B28B 1/54 (2006.01); B29D 22/00 (2006.01); B33Y 80/00 (2015.01); F01D 5/18 (2006.01); F01D 5/28 (2006.01);
U.S. Cl.
CPC ...
C04B 35/573 (2013.01); B28B 1/54 (2013.01); B29D 22/00 (2013.01); B33Y 80/00 (2014.12); C04B 2235/6026 (2013.01); C04B 2235/6028 (2013.01); F01D 5/187 (2013.01); F01D 5/282 (2013.01); F01D 5/284 (2013.01); F05D 2300/6033 (2013.01); Y10T 428/131 (2015.01);
Abstract
A process for producing an internal cavity in a CMC article and mandrels used therewith. The process entails incorporating a mandrel made of a material that is substantially absorbed during thermal treatment of a preform to form the CMC article. The mandrel material is preferably reactive with one or more constituents of the CMC preform during the thermal treatment. The material is preferably silicon or a silicon alloy.