The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2019
Filed:
Oct. 02, 2012
Applicants:
Jnc Corporation, Tokyo, JP;
Jnc Fibers Corporation, Tokyo, JP;
Inventors:
Takafumi Ito, Shiga, JP;
Junji Iwata, Shiga, JP;
Yasushi Matsuda, Shiga, JP;
Mitsuru Kojima, Shiga, JP;
Assignees:
JNC CORPORATION, Tokyo, JP;
JNC FIBERS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A45D 44/00 (2006.01); A45D 44/22 (2006.01); A61F 13/12 (2006.01);
U.S. Cl.
CPC ...
A45D 44/002 (2013.01); A45D 44/22 (2013.01); A61F 13/122 (2013.01);
Abstract
A cosmetic facial mask is described, having high fitting properties onto skin, an excellent skin tightening effect, and an excellent lift-up effect on a flaccid cheek or face line. The cosmetic facial mask includes a laminate in which a non-elastomeric fiber layer and an elastomer layer are integrated through lamination, and has stretchability in a vertical direction of a face.