The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Dec. 14, 2017
Applicant:
Sendyne Corporation, New York, NY (US);
Inventor:
Yannis Tsividis, New York, NY (US);
Assignee:
Sendyne Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H03H 17/02 (2006.01); G06F 17/10 (2006.01); G01R 19/25 (2006.01); G01R 19/00 (2006.01); H03H 7/06 (2006.01); H03H 17/04 (2006.01); G01R 23/165 (2006.01);
U.S. Cl.
CPC ...
H03H 17/0219 (2013.01); G01R 19/0007 (2013.01); G01R 19/2506 (2013.01); G06F 17/10 (2013.01); H03H 17/0202 (2013.01); G01R 23/165 (2013.01); H03H 7/06 (2013.01); H03H 17/04 (2013.01); H03H 2017/021 (2013.01);
Abstract
A method and apparatus to compensate for distortion of a waveform due to the skin effect in a current shunt. The method includes modeling the complex impedance of the shunt as component complex impedances. By designing a filter corresponding to the component complex impedances, the distortion of a waveform across the shunt may be reversed to provide an accurate replica of the undistorted waveform.