The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Nov. 11, 2017
Applicant:

Xiamen Sanan Optoelectronics Technology Co., Ltd., Xiamen, CN;

Inventors:

Jin Wang, Xiamen, CN;

Yi-an Lu, Xiamen, CN;

Chun-Yi Wu, Xiamen, CN;

Ching-Shan Tao, Xiamen, CN;

Duxiang Wang, Xiamen, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 33/38 (2010.01); H01L 33/62 (2010.01); H01L 33/24 (2010.01); H01L 33/40 (2010.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 33/382 (2013.01); H01L 33/24 (2013.01); H01L 33/385 (2013.01); H01L 33/405 (2013.01); H01L 33/62 (2013.01); H01L 33/0079 (2013.01); H01L 33/0095 (2013.01); H01L 2933/0016 (2013.01); H01L 2933/0091 (2013.01);
Abstract

A fabrication method of a vertical light-emitting diode, such as an infrared light-emitting diode, includes heating the reaction chamber during growth of the reflective layer to pre-diffuse the metal molecules of the reflective layer into the epitaxial layer. As a result, the diffusion of the metal molecules in the reflective layer into the epitaxial layer during high-temperature fusion of the reflective layer and the epitaxial layer slows down, and the blackness level of conventional ohm contact holes is reduced.


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