The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Jun. 27, 2018
Fuji Electric Co., Ltd., Kawasaki-shi, Kanagawa, JP;
Naoki Kuneshita, Matsumoto, JP;
FUJI ELECTRIC CO., LTD., Kawasaki-Shi, Kanagawa, JP;
Abstract
An interlayer insulating film is dry etched using a CHFgas and by using, as a mask, a resist film having a first opening and a second opening that is wider than the first opening, thereby forming a first contact hole of a predetermined depth in the first opening and forming a second contact hole in the second opening. The gas in a furnace is switched to a CFgas and the first contact hole is embedded with a polymer by the CFgas. The gas in the furnace is switched to a CHFgas. With the first contact hole protected by the polymer, the interlayer insulating film is dry etched using the same resist film as a mask, making a depth of the second contact hole a predetermined depth deeper than that of the first contact hole. Thereafter, the resist film and the polymer are removed.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile