The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Mar. 01, 2017
Applicant:
Spts Technologies Limited, Newport, GB;
Inventor:
Paul Bennett, Bristol, GB;
Assignee:
SPTS TECHNOLOGIES LIMITED, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B08B 7/00 (2006.01); B08B 9/08 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 16/503 (2006.01); C23C 16/505 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); B08B 7/0035 (2013.01); B08B 9/08 (2013.01); C23C 16/4405 (2013.01); C23C 16/448 (2013.01); C23C 16/503 (2013.01); C23C 16/505 (2013.01); H01J 37/321 (2013.01); H01J 37/3211 (2013.01); H01J 37/32541 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01); H01J 2237/3321 (2013.01); H01L 21/67069 (2013.01);
Abstract
A plasma processing apparatus for plasma processing a substrate comprising includes a chamber having one or more walls, in which a portion of the walls of the chamber is an electrode structure formed from a metallic material and configured to act as a primary winding of an inductively coupled plasma source, and an electrical signal supply device for supplying an electrical signal that drives the electrode structure as a primary winding of an inductively coupled plasma source to sustain an inductively coupled plasma within the chamber.