The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Dec. 21, 2016
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Jonas Boehler, Karlsruhe, DE;

Daniel Bernau, Karlsruhe, DE;

Florian Kerschbaum, Frankfurt, DE;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 21/62 (2013.01); G06F 16/28 (2019.01); H04W 4/38 (2018.01); H04W 12/02 (2009.01); H04L 29/06 (2006.01);
U.S. Cl.
CPC ...
G06F 21/6254 (2013.01); G06F 16/285 (2019.01); H04L 63/0421 (2013.01); H04W 4/38 (2018.02); H04W 12/02 (2013.01);
Abstract

A system for differential privacy is provided. In some implementations, the system performs operations comprising receiving a plurality of indices for a plurality of perturbed data points, which are anonymized versions of a plurality of unperturbed data points, wherein the plurality of indices indicate that the plurality of unperturbed data points are identified as presumed outliers. The plurality of perturbed data points can lie around a first center point and the plurality of unperturbed data points can lie around a second center point. The operations can further comprise classifying a portion of the presumed outliers as true positives and another portion of the presumed outliers as false positives, based upon differences in distances to the respective first and second center points for the perturbed and corresponding (e.g., same index) unperturbed data points. Related systems, methods, and articles of manufacture are also described.


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