The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
May. 03, 2018
Applicant:
Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventor:
Man-Jong Yu, Hwaseong-si, KR;
Assignee:
Samsung Display Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); G03F 1/38 (2012.01); H01L 21/3213 (2006.01); H01L 21/027 (2006.01); G03F 1/70 (2012.01); H01L 21/768 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 1/70 (2013.01); H01L 21/0274 (2013.01); H01L 21/32139 (2013.01); H01L 21/76838 (2013.01); H01L 27/1288 (2013.01);
Abstract
A photomask layout includes: a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region and including at least one notch portion at an area overlapping the lower stepped region. A method of forming a pattern is also provided.