The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Apr. 27, 2018
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Shenzhen, Guangdong, CN;
Maoxia Zhu, Guangdong, CN;
Hongyuan Xu, Guangdong, CN;
Abstract
The present disclosure provides a method for manufacturing an array substrate. An ashing treatment is performed on the first photoresist pattern to remove the photoresist layer in the photoresist-partially-retained-region and to thin the photoresist layer in the photoresist-entirely-retained-region, so that a second photoresist pattern is generated. Thereafter, the passivation layer is etched using the second photoresist pattern as a mask to thin the passivation layer in the photoresist-partially-retained-region and to reduce roughness of the rough top surface in the photoresist-partially-retained-region. Therefore, process stability is raised.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile