The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Apr. 24, 2014
Applicant:
View, Inc., Milpitas, CA (US);
Inventor:
Martin John Neumann, Pekin, IL (US);
Assignee:
View, Inc., Milpitas, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/54 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01); C23C 14/18 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3457 (2013.01); C23C 14/185 (2013.01); C23C 14/3492 (2013.01); C23C 14/54 (2013.01); H01J 37/32733 (2013.01); H01J 37/3426 (2013.01); H01J 37/3476 (2013.01); H01J 2237/036 (2013.01); H01J 2237/202 (2013.01); H01J 2237/2487 (2013.01); H01J 2237/327 (2013.01); H01J 2237/332 (2013.01);
Abstract
A method of sustained self-sputtering of lithium in a sputtering station having a lithium metal target, the method comprising initiating a lithium sputtering reaction in the sputtering station by igniting an initial plasma comprising a majority fraction of inert gas ions and inducing a sustained lithium self-sputtering reaction by reducing supply of an inert gas to the sputtering station under conditions that provide a sustained self-sputtering lithium plasma comprising a majority fraction of lithium ions.