The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Jun. 03, 2016
Applicant:
Ihi Corporation, Koto-ku, JP;
Inventors:
Norimitsu Kameya, Tokyo, JP;
Kenji Fuchigami, Tokyo, JP;
Assignee:
IHI Corporation, Koto-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 8/36 (2006.01); C23C 8/04 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 8/36 (2013.01); C23C 8/04 (2013.01); H01J 37/32366 (2013.01); H01J 37/32522 (2013.01); H01J 37/32568 (2013.01); F05D 2220/323 (2013.01); F05D 2230/90 (2013.01); F05D 2240/61 (2013.01); H01J 37/3244 (2013.01); H01J 37/32513 (2013.01); H01J 2237/327 (2013.01); H01J 2237/3387 (2013.01);
Abstract
A plasma nitriding apparatus includes: a surface treatment unit which includes a treatment tank to house part of a treatment object inclusive of a surface treatment region, and performs a nitriding treatment on the surface treatment region inside of the treatment tank by using plasma of a treatment gas; and an outer container which receives supply of the treatment gas, and houses the treatment object and the treatment tank so that a region of the treatment object other than the part is exposed from the treatment tank.