The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2019
Filed:
Mar. 11, 2014
Applicants:
Yi-wen Wang, Taipei, TW;
Niann-tzyy Dai, Taipei, TW;
Inventors:
Yi-Wen Wang, Taipei, TW;
Niann-Tzyy Dai, Taipei, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 15/113 (2010.01); A61K 31/713 (2006.01); A61K 38/02 (2006.01); C12N 7/00 (2006.01); A61K 31/7088 (2006.01); A61K 31/7105 (2006.01);
U.S. Cl.
CPC ...
C12N 15/1138 (2013.01); A61K 31/7088 (2013.01); A61K 31/713 (2013.01); A61K 31/7105 (2013.01); A61K 38/02 (2013.01); C12N 7/00 (2013.01); C12N 2310/14 (2013.01); C12N 2320/30 (2013.01); C12N 2740/15041 (2013.01); C12N 2750/14141 (2013.01);
Abstract
Disclosed herein is a pharmaceutical composition for reducing scar formation in a subject in need thereof. The pharmaceutical composition includes a mixture of three nucleic acids and a pharmaceutically acceptable carrier. A method for reducing scar formation in a subject in need thereof is also disclosed herein.