The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2019

Filed:

Sep. 30, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Kyoung Whan Oh, Hwaseong-si, KR;

Yeon Woo Choi, Suwon-si, KR;

In Hwan Kim, Hwaseong-si, KR;

Won Ki Park, Seoul, KR;

Ho Youl Lee, Suwon-si, KR;

Yong Won Choi, Yongin-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/08 (2014.01); B23K 26/402 (2014.01); B23K 26/03 (2006.01); B23K 26/38 (2014.01); H01L 21/67 (2006.01); H01L 21/78 (2006.01); B23K 103/00 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
B23K 26/0876 (2013.01); B23K 26/03 (2013.01); B23K 26/032 (2013.01); B23K 26/38 (2013.01); B23K 26/402 (2013.01); H01L 21/67092 (2013.01); H01L 21/67259 (2013.01); H01L 21/78 (2013.01); B23K 2101/40 (2018.08); B23K 2103/56 (2018.08);
Abstract

A wafer cutting apparatus includes a stage to support a wafer, a cutter, and a sensor. The cutter irradiates the wafer with a beam in a first direction to cut the wafer. The sensor is spaced apart from the cutter in a second direction different from the first direction, and measures a spaced distance between the wafer and the cutter. The sensor measures the spaced distance between the wafer and the cutter along a second cutting line parallel to a first cutting line while the cutter cuts the wafer along the first cutting line on the wafer.


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