The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

Dec. 04, 2017
Applicant:

AU Optronics Corporation, Hsinchu, TW;

Inventors:

Rung-Guang Hu, Taoyuan, TW;

Wei-Yuan Huang, Miaoli County, TW;

Sung-Ying Tsai, Taichung, TW;

Hsiang-Pin Fan, Hsinchu, TW;

Pin-Miao Liu, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01); G02F 1/1335 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13394 (2013.01); G02F 1/133512 (2013.01); G02F 1/133514 (2013.01); G02F 2001/13396 (2013.01); G02F 2001/133388 (2013.01);
Abstract

A color filter substrate and a display panel are provided. The color filter substrate includes a substrate, first spacers, second spacers, color resist patterns, and at least one dummy-color resist pattern. A first area has a first projection area A. A second area has a second projection area B. The color resist patterns are disposed at least partially around of at least one of the first spacers. A covering area of the color resist patterns in the first area is a. (a/A)*100% is defined as a first coverage rate M. The dummy-color resist pattern is disposed at least partially around of at least one of the second spacers. The covering area of the dummy-color resist pattern in the second area is b. (b/B)*100% is defined as a second coverage rate N. The first projected area A is equal to the second projected area B and 27%≤(N−M)≤58%.


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