The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2019
Filed:
Jan. 05, 2018
Nanchang Hangkong University, Nanchang, CN;
Tsinghua University, Beijing, CN;
NANCHANG HANGKONG UNIVERSITY, Nanchang, CN;
TSINGHUA UNIVERSITY, Beijing, CN;
Abstract
A method for adjusting array of omnidirectional EMATs includes: uniformly arranging N EMATs in a detection region of a metal plate; calculating positions of scattering points according to amplitudes and travel times of guided wave scattering signals, and forming a first defect profile curve by performing three smooth spline interpolations on coordinate data of positions of scattering points; calculating curvatures of points on the first defect profile curve by solving a first and second derivatives of a function of the first defect profile curve; determining an array adjustment region by comparing the curvature with a preset threshold, adjusting the array and calculating a second defect profile curve; and performing data fusion on the first and second defect profile curves to form a defect profile image of the metal plate.