The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

Jan. 13, 2015
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

William Mark Richards, Flower Mound, TX (US);

Thomas Jules Frosell, Irving, TX (US);

Gregory William Garrison, Dallas, TX (US);

Tyson Harvey Eiman, Frisco, TX (US);

Syed Hamid, Dallas, TX (US);

Colby Munro Ross, Dallas, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 21/08 (2006.01); E21B 43/12 (2006.01); E21B 34/08 (2006.01); E21B 21/10 (2006.01); E21B 47/06 (2012.01); E21B 43/04 (2006.01); H01F 1/44 (2006.01); E21B 47/09 (2012.01); E21B 34/10 (2006.01);
U.S. Cl.
CPC ...
E21B 21/08 (2013.01); E21B 21/103 (2013.01); E21B 34/108 (2013.01); E21B 43/04 (2013.01); E21B 43/128 (2013.01); E21B 47/06 (2013.01); E21B 47/091 (2013.01); H01F 1/447 (2013.01);
Abstract

A method and apparatus that includes an elongated base pipe having an external surface at least partially defining an external region and an internal surface at least partially defining an internal region; and a pressure maintenance device disposed in the base pipe and comprising: a flow path that extends between the internal region and the external region; and a valve having a gas charged chamber, the valve allowing the flow of a fluid from the internal region to the external region through the first flow path when a pressure differential between a pressure associated with the internal region and a pressure associated with the gas charged chamber is less than a maximum pressure threshold and when a pressure differential between the external region and the pressure associated with the gas charged chamber is greater than a minimum pressure threshold.


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