The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

May. 26, 2015
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Shigemasa Nakasugi, Kakegawa, JP;

Takafumi Kinuta, Kakegawa, JP;

Go Noya, Kakegawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 65/02 (2006.01); C08G 61/12 (2006.01); C08L 65/00 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01); C08L 71/00 (2006.01); C08L 71/12 (2006.01); C08L 77/10 (2006.01); C08L 79/02 (2006.01); C08L 81/02 (2006.01); C08L 81/06 (2006.01); C08G 73/02 (2006.01); C08L 85/02 (2006.01); C08L 85/04 (2006.01);
U.S. Cl.
CPC ...
C08L 65/02 (2013.01); C08G 61/12 (2013.01); C08L 65/00 (2013.01); C08L 71/00 (2013.01); C08L 71/12 (2013.01); C08L 77/10 (2013.01); C08L 79/02 (2013.01); C08L 81/02 (2013.01); C08L 81/06 (2013.01); C08L 85/02 (2013.01); C08L 85/04 (2013.01); H01L 21/768 (2013.01); H01L 21/76802 (2013.01); H01L 21/76877 (2013.01); H01L 23/532 (2013.01); H01L 23/5329 (2013.01); C08G 73/026 (2013.01); C08G 2261/11 (2013.01); C08G 2261/312 (2013.01); C08G 2261/3162 (2013.01); C08G 2650/40 (2013.01); H01L 2924/0002 (2013.01);
Abstract

To provide a composition for gap formation capable of forming sacrifice areas made of a sacrificial material decomposable completely into vapor at a desired temperature, and also to provide a semiconductor device-manufacturing method using the composition. Disclosed is a composition for gap formation comprising a polymer and a solvent: wherein said polymer comprising five or more of repeating units which are represented by at least one kind of the following formula (1) or (2):Ar-L  ()Ar-L-Ar  ()[each of Ar, Arand Aris independently a substituted or unsubstituted aromatic group; and each of Land Lis independently oxygen, sulfur, alkyl, sulfone, amide, ketone or a group represented by the following formula (3): {Aris an aromatic group; and Lis a trivalent atom selected from the group consisting of nitrogen, boron and phosphorus}].


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