The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2019
Filed:
Jun. 12, 2017
Applicant:
Fujitsu Ten Limited, Kobe-shi, JP;
Inventor:
Hisaki Hayashi, Kobe, JP;
Assignee:
FUJITSU TEN LIMITED, Kobe-Shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
B23K 1/20 (2006.01); H05K 3/34 (2006.01); B23K 3/08 (2006.01); B05B 7/00 (2006.01); B05D 1/02 (2006.01); B23K 3/06 (2006.01); B05B 7/24 (2006.01); B23K 1/08 (2006.01); B23K 101/42 (2006.01);
U.S. Cl.
CPC ...
B23K 1/203 (2013.01); B05B 7/0075 (2013.01); B05D 1/02 (2013.01); B23K 1/206 (2013.01); B23K 3/082 (2013.01); H05K 3/3489 (2013.01); B05B 7/24 (2013.01); B23K 1/08 (2013.01); B23K 3/0653 (2013.01); B23K 2101/42 (2018.08);
Abstract
There is provided a flux applying apparatus configured to jet and apply a flux to a target, whereby the flux applying apparatus is capable of rapidly collecting a surplus flux in a sub-tank and returning the same to the main tank for further jetting and applying. In particular, the flux applying apparatus is coupled to a control unit capable of estimating a flux amount trapped in the sub-tank on the basis of a time period for which the flux is to be jetted from the nozzle.