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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10431669 B1

PDFFull Text
Date of Patent:
Oct. 01, 2019

Filed:

Oct. 16, 2015

Polysilicon thin film and manufacturing method thereof, tft and manufacturing method thereof, and display panel

Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Xiaolong Li, Beijing, CN;

Zheng Liu, Beijing, CN;

Xiaoyong Lu, Beijing, CN;

Dong Li, Beijing, CN;

Chunping Long, Beijing, CN;

Assignee:

BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;

Attorney:

Armstrong Teasdale LLP

Primary Examiner:

Joseph C Nicely

Assistant Examiner:

Pavel G Ivanov

Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 21/20 (2006.01); H01L 21/265 (2006.01); H01L 21/28 (2006.01); H01L 27/12 (2006.01); H01L 29/06 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66757 (2013.01); H01L 21/2026 (2013.01); H01L 21/265 (2013.01); H01L 21/28 (2013.01); H01L 27/1281 (2013.01); H01L 27/1296 (2013.01); H01L 29/06 (2013.01); H01L 29/78696 (2013.01);
Abstract

A manufacturing method for a polysilicon thin film is provided. The manufacturing method for a polysilicon thin film includes forming a polysilicon layer, treating a surface of the polysilicon layer so that the surface of the polysilicon layer is electronegative, and supplying polar gas into a process chamber so that polar molecules of the polar gas are adsorbed on the surface of the polysilicon layer which is electronegative so as to form the polysilicon thin film, a surface of which has a hole density higher than an electron density.

Find Patent Forward Citations

Li, Xiaolong. (2019). Polysilicon thin film and manufacturing method thereof, tft and manufacturing method thereof, and display panel (U.S. Patent No. 10431669). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10431669

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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