The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Jun. 27, 2016
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

California Institute of Technology, Pasadena, CA (US);

Inventors:

Seunghoon Han, Seoul, KR;

Yongsung Kim, Suwon-si, KR;

Seyedeh Mahsa Kamali, Pasadena, CA (US);

Amir Arbabi, Pasadena, CA (US);

Yu Horie, Pasadena, CA (US);

Andrei Faraon, Pasadena, CA (US);

Sungwoo Hwang, Seoul, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/14 (2006.01); H01L 27/12 (2006.01); H01L 21/76 (2006.01); H01L 27/146 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14685 (2013.01); H01L 27/1203 (2013.01); H01L 27/14621 (2013.01); H01L 27/14698 (2013.01); H01L 21/76254 (2013.01); H01L 21/76256 (2013.01);
Abstract

A method of manufacturing an image sensor includes: preparing a sensor substrate including: a sensor layer including a photosensitive cell; and a signal line layer including lines to receive electric signals from the photosensitive cell; forming a first material layer having a first refractive index on the sensor substrate; and forming a nanopattern layer on the first material layer, the nanopattern layer including a material having a second refractive index different from the first refractive index.


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