The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Jan. 22, 2018
Kabushiki Kaisha Toshiba, Minato-ku, Tokyo, JP;
Toshiba Electronic Devices & Storage Corporation, Minato-ku, Tokyo, JP;
Yuhki Fujino, Kanazawa Ishikawa, JP;
Noboru Yokoyama, Kanazawa Ishikawa, JP;
Hideki Okumura, Nonoichi Ishikawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;
Abstract
According to an embodiment, a method of manufacturing a semiconductor device includes forming a semiconductor layer having a first conductivity type on a semiconductor substrate, forming a trench in the semiconductor substrate and the semiconductor layer, forming a semiconductor film having a second conductivity type on an inner wall surface and a bottom surface of the trench, forming a first insulating film including silicon oxide on a side surface and a bottom surface of the semiconductor film, forming a second insulating film including silicon nitride on a side surface and a bottom surface of the first insulating film, and forming a third insulating film including silicon oxide on a side surface and a bottom surface of the second insulating film.