The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10429751 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 01, 2019

Filed:

Aug. 22, 2016
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Chaohua Lu, Beijing, CN;

Yongliang Wang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01); G06K 9/32 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G03F 7/0007 (2013.01); G03F 9/7076 (2013.01); G03F 9/7084 (2013.01); G06K 9/3216 (2013.01); G06K 2009/3225 (2013.01);
Abstract

An alignment mark searching method is for searching an alignment mark on a base substrate, a first positioning line segment is formed in a dummy region of the base substrate, and a straight line where the first positioning line segment is positioned running through the alignment mark. The method includes: acquiring theoretical coordinates of the alignment mark; moving a detection system view field to a target position with the theoretical coordinates as a target; moving the detection system view field from the target position in a direction perpendicular to the first positioning line segment until the first positioning line segment appears in the detection system view field; and moving the detection system view field from the position of the first positioning line segment in a length direction of the first positioning line segment until the alignment mark appears in the detection system view field. The method achieves an effect that the alignment mark can be simply, conveniently and rapidly searched. A display substrate and a display apparatus are further disclosed.


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Lu, Chaohua. (2019). Alignment mark searching method, display substrate and display apparatus (U.S. Patent No. 10429751). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10429751

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