The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Oct. 05, 2016
Applicant:

Nalux Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Daisuke Seki, Osaka, JP;

Norihisa Sakagami, Osaka, JP;

Assignee:

NALUX CO., LTD., Osaka-Shi, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 5/02 (2006.01); G02B 27/09 (2006.01); G02B 27/30 (2006.01); F21V 5/00 (2018.01); F21V 5/04 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0056 (2013.01); G02B 3/0006 (2013.01); G02B 5/0215 (2013.01); G02B 5/0231 (2013.01); G02B 27/0961 (2013.01); G02B 27/30 (2013.01); F21V 5/004 (2013.01); F21V 5/008 (2013.01); F21V 5/04 (2013.01);
Abstract

A microlens array, each microlens containing N sides of a convex polygon and N curved surfaces corresponding to the sides, wherein when the line passing through the microlens vertex and perpendicular to the polygon plane is z axis, the line passing through the intersection point (origin) between z axis and the plane and perpendicular to a side is x axis, z coordinate of the curved surface corresponding to the side is(),a distance from the origin to the side is t, a virtual curved surface in 0≤|x|≤t is(),refractive index of the microlens is no, A and C represents constants, and is satisfied and f (x) is determined such that an illuminance distribution in an illuminated area is more uniform than that in the case that the curved surface is shaped in a segment of a circle.


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