The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2019
Filed:
Dec. 16, 2013
Hitachi, Ltd., Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
There is provided an analysis model creation method which is capable of simply and quickly creating an accurate analysis model with respect to a structure including a crystalline material. In order to solve a problem described above, there is provided a model creation method of an analysis region used in numeral analysis, the method including a step of designating a crystal growth direction if a region is a region including crystallinity including acoustic anisotropy in the analysis region, a step of selecting partial image data to which the crystallinity of the region is reflected, a step of rotating and operating the partial image data along the crystal growth direction, and a step of creating image data which is covered in the region designated using the rotated partial image data.