The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2019

Filed:

Mar. 02, 2018
Applicant:

Hitachi Metals, Ltd., Tokyo, JP;

Inventors:

Yoshitaka Sasago, Tokyo, JP;

Shuntaro Machida, Tokyo, JP;

Hitoshi Nakamura, Tokyo, JP;

Takahiro Odaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/414 (2006.01); H01L 23/29 (2006.01); H01L 29/49 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
G01N 27/4141 (2013.01); H01L 23/291 (2013.01); H01L 23/3192 (2013.01); H01L 29/4966 (2013.01);
Abstract

A sensor element includes a sensor FET provided in a main surface of a semiconductor substrate, a cavity provided in the sensor FET and into which a detection target gas is introduced, and an ion pump provided over the cavity. By laminating the ion pump over the sensor FET via the cavity, a part of a front surface of a gate layer is exposed to the cavity, and a part of a lower surface of an ion pump electrode is exposed to the cavity. When the gate layer comes into contact with the detection target gas, a work function changes, so that gas concentration can be detected.


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