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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10428415 B1

PDFFull Text
Date of Patent:
Oct. 01, 2019

Filed:

Aug. 04, 2016

Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby

Applicant:

Ap Systems Inc., Gyeonggi-do, KR;

Inventors:

Jong-Kab Park, Gyenggi-do, KR;

Bo-Ram Kim, Gyeonggi-do, KR;

Jun-Gyu Hur, Busan, KR;

Doh-Hoon Kim, Seoul, KR;

Assignee:

AP SYSTEMS INC., , KR;

Attorney:

Mendelsohn Dunleavy, P.C.

Primary Examiner:

Stephanie P Duclair

Int. Cl.
CPC ...
C23C 14/04 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); G03F 7/095 (2006.01); G03F 7/12 (2006.01); B23K 26/352 (2014.01); H01L 21/31 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B23K 26/352 (2015.10); G03F 7/0957 (2013.01); G03F 7/12 (2013.01); H01L 21/027 (2013.01); H01L 21/0338 (2013.01); H01L 21/31 (2013.01); H01L 51/0011 (2013.01); Y10S 148/143 (2013.01);
Abstract

The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.

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